F60-c Film Thickness Mapping Instrument for Production Environments

Automated Cassette-to-Cassette Thin-Film Thickness Mapping System for Production Environments
The Filmetrics® F60-c family maps film thickness and index just like our F50 products, but it also includes a number of features intended specifically for production environments. These include automatic notch finding, automatic on-board baselining, an enclosed measurement stage with motion interlock, and an industrial computer with pre-installed software, and cassette-to-cassette robotic wafer handling. The re-engineered F60-c combines Filmetrics film thickness mapping technology with the improved automation of KLA Instruments™ production metrology systems.

The different F60-c instruments are distinguished primarily by thickness and wavelength range. Generally shorter wavelengths (e.g., F60-c-UV) are required to measure thinner films, while longer wavelengths allow measurement of thicker, rougher, and more opaque films.

Model Specifications

Model Thickness Range* Wavelength Range
F60-c 20nm - 70µm 380-1050nm
F60-c-UV 5nm - 40µm 190-1100nm
F60-c-NIR 100nm - 250µm 950-1700nm
F60-c-EXR 20nm - 250µm 380-1700nm
F60-c-UVX 5nm - 250µm 190-1700nm
F60-c-XT 0.2µm - 450µm 1440-1690nm
F60-c-s1310 7µm - 2mm 1280-1340nm
*film stack dependent

Thickness Measurement Range*

F60-c-UV F60-c-UVX F60-c F60-c-EXR F60-c-NIR F60-c-XT F60-c-s1310 1nm 10nm 100nm 1µm 10µm 100µm 1mm 10mm
F60-c-UV F60-c-UVX F60-c F60-c-EXR F60-c-NIR F60-c-XT F60-c-s1310 1nm 10nm 100nm 1µm 10µm 100µm 1mm 10mm

What’s Included

Additional Perks

Common Optional Accessories