F54-XY Series Automated Film Thickness Measurement Mapping Instrument

Automated Film Thickness Mapping for Patterned Samples
Thin-film thickness on samples up to 300mm is easily mapped with the F54-XY advanced spectral reflectance system. F54-XY-200 configurations measure samples up to 200mm using a motorized X-Y stage that moves automatically to specified measurement locations, facilitating thickness measurements as quickly as two points per second. Measurements of 300mm wafers are supported by the additional high performance rotary stage in the F54-XYT-300 configuration.

Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points on our automated film thickness mapping system. The systems support measurement of unpatterened and patterned samples using pattern recognition software.

Different models of the F54-XY are distinguished primarily by film thickness and wavelength range. Generally, shorter wavelengths (e.g. F54-XY-200-UV) are required for measurement of thinner films, while longer wavelengths allow measurement of thicker, rougher, and more opaque films.

Model Specifications

Model Thickness Range* Wavelength Range
F54-XY 20nm - 50µm 380-1050nm
F54-XY-UV 4nm - 35µm 190-1100nm
F54-XY-NIR 100nm - 120µm 950-1700nm
F54-XY-EXR 20nm - 120µm 380-1700nm
F54-XY-UVX 4nm - 120µm 190-1700nm
*Material and objective dependent

Thickness Measurement Range*

F54-XY-UV F54-XY-UVX F54-XY F54-XY-EXR F54-XY-NIR 1nm 10nm 100nm 1µm 10µm 100µm 1mm
F54-XY-UV F54-XY-UVX F54-XY F54-XY-EXR F54-XY-NIR 1nm 10nm 100nm 1µm 10µm 100µm 1mm

F54-XY Options

What’s Included

Additional Perks

Common Optional Accessories