Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points on our automated film thickness mapping system. The systems support measurement of unpatterened and patterned samples using pattern recognition software.
Different models of the F54-XY are distinguished primarily by film thickness and wavelength range. Generally, shorter wavelengths (e.g. F54-XY-200-UV) are required for measurement of thinner films, while longer wavelengths allow measurement of thicker, rougher, and more opaque films.
|Model||Thickness Range*||Wavelength Range|
|F54-XY||20nm - 50µm||380-1050nm|
|F54-XY-UV||4nm - 35µm||190-1100nm|
|F54-XY-NIR||100nm - 120µm||950-1700nm|
|F54-XY-EXR||20nm - 120µm||380-1700nm|
|F54-XY-UVX||4nm - 120µm||190-1700nm|
|*Material and objective dependent|