F30 Series

The Most Powerful Tool Available for Monitoring Thin-Film Deposition
Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.

Example Layers
The different F60-t instruments are distinguished primarily by thickness and wavelength range. Generally shorter wavelengths (e.g. F60-t-UV) are required to measure thinner films, while longer wavelengths allow measurement of thicker, rougher, and more opaque films.

Model Specifications

Model Thickness Range* Wavelength Range
F30 15nm - 70µm 380-1050nm
F30-UV 3nm - 40µm 190-1100nm
F30-NIR 100nm - 250µm 950-1700nm
F30-EXR 15nm - 250µm 380-1700nm
F30-UVX 3nm - 250µm 190-1700nm
F30-XT .2µm - 450µm 1440-1690nm
*film stack dependent

Thickness Range*

F30-UV F30-UVX F30 F30-EXR F30-NIR F30-XT 1nm 10nm 100nm 1µm 10µm 100µm 1mm
F30-UV F30-UVX F30 F30-EXR F30-NIR F30-XT 1nm 10nm 100nm 1µm 10µm 100µm 1mm

Benefits:

Common Optional Accessories