F37

Measure film thickness in-line and in real-time at up to seven locations with the F37.

Example Layers

Almost any smooth and at-least-partially transparent films may be measured. This includes virtually any semiconducting material, including those used in thin-film photovoltaics.

Example Layers

MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.

Benefits:

  • Dramatically improves productivity
  • Low cost-Can pay for itself in months
  • Accurate-Measure to better than ±1%
  • Fast-Measurements in seconds
  • Non-Invasive-Totally outside of deposition chamber
  • Easy to use-Intuitive Windows® software
  • Turn-key system sets up in minutes

Model Specifications

*Film stack dependent
Model Thickness Range* Wavelength Range
F37-SPEC-2 15nm-100µm 380-1050nm
F37-SPEC-2-UV 3nm-40µm 190-1100nm
F37-SPEC-2-NIR 100nm-250µm 950-1700nm
F37-SPEC-2-XT 0.2µm-450µm 1440-1690nm