F30 Series

The Most Powerful Tool Available for Monitoring Thin-Film Deposition

Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.

Example Layers

MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.

Benefits:

  • Dramatically improves productivity
  • Low cost - Can pay for itself in months
  • Accurate - Measure to better than ±1%
  • Fast-Measurements in seconds
  • Non-Invasive - Totally outside of deposition chamber
  • Easy to use - Intuitive Windows™ software
  • Turn-key system sets up in minutes

Model Specifications

*Film stack dependent
Model Thickness Range* Wavelength Range
F30 15nm-70µm 380-1050nm
F30-EXR 15nm - 250µm 380-1700nm
F30-NIR 100nm - 250µm 950-1700nm
F30-UV 3nm-40µm 200-1100nm
F30-UVX 3nm - 250µm 200-1700nm
F30-XT 0.2µm - 450µm 1440-1690nm
F30-XXT 5µm-3mm 1520-1580nm

Common Optional Accessories