The Most Powerful Tool Available for Monitoring Thin-Film Deposition

Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.

Example Layers

MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.

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Benefits

  • Dramatically improves productivity
  • Low cost - Can pay for itself in months
  • Accurate - Measure to better than ±1%
  • Fast-Measurements in seconds
  • Non-Invasive - Totally outside of deposition chamber
  • Easy to use - Intuitive Windows™ software
  • Turn-key system sets up in minutes

Common Optional Accessories