Automated Thin-Film Thickness Mapping System

Thin-film thickness and n&k are mapped quickly and easily with the F50 advanced spectral reflectance system. The motorized R-θ stage moves automatically to selected measurement points and provides thickness measurements in seconds. Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and can be used by anyone with basic computer skills.

For complete specifications
Download the F50 datasheet (222 kB)

Example Layers
Virtually any smooth, translucent, or lightly absorbing film may be measured. This includes:
SiO2
SiNX
DLC
Photoresist
Polymer layers
Polyimide
Polysilicon
Silicon

Example Substrates
All that is required in most cases is a smooth, reflective substrate. Examples include:
Silicon
Glass
Aluminum
GaAs
Steel
Polycarbonate