The Most Powerful Tool Available for
Monitoring Thin-Film Deposition

Measure deposition rates, layer thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectometry system.

For complete specifications
Download the F30 datasheet (227 kB)

Example Layers
MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.

Benefits
• Dramatically Improves Productivity
• Low Cost—Can pay for itself in months
• Accurate—Measure to better than ±1%
• Fast—Measurements in seconds
• Non-Invasive—Totally outside of deposition chamber
• Easy To Use—Intuitive Windows™ software
• Turn-Key System Sets Up In Minutes