Thousands of dielectric films are used in optics, semiconductors, and dozens of other industries, and Filmetrics stocks instruments that can measure virtually all of them. Here are some of the most common dielectrics:
SiO2 – Silicon dioxide is one of the simplest materials to measure, primarily because it is non-absorbing (k=0) over most wavelengths and is usually very close to being stoichiometric (i.e. the Si:O ratio is very close to exactly 1:2). Thermally-grown SiO2 is particularly well-behaved and is commonly used for thickness and refractive index standards. Filmetrics has systems that can measure SiO2 from 3nm up to 1mm thick.
Si3N4 – The measurement of silicon nitride films is more challenging than that of many other dielectrics because the film’s Si:N ratio is rarely exactly 3:4, and thus the refractive index must usually be measured along with the film thickness. To complicate matters, oxygen is often unintentionally incorporated into the films, creating silicon oxynitride to some degree. Fortunately, our systems allow complete characterization of your Si3N4 film in seconds, with only a single mouse-click!
Contact our thin-film experts to discuss your dielectric application.
Filmetrics offers free trial measurements- results are typically available in 1-2 days
Thickness Measurement Example
Silicon nitride films are widely used in the semiconductor industry as dielectrics, passivation layers, or mask materials. In this example, we successfully measure the thickness, refractive index, and extinction coefficient of a thin SixNy film on Si using our F20-UVX instrument. One interesting note is that the optical properties of SixNy films are correlated to the stoichiometry of the film. By using our F20-UVX along with Filmetrics’ proprietary silicon nitride dispersion model, one can easily measure the thickness and optical properties of SixNy films regardless of whether they are Si-rich, Si-poor, or stoichiometric.
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Amorphous & Polysilicon
Measure thickness, crystallinity, and n and k of all forms of amorphous and polycrystalline silicon.
Our F80 Thickness Imaging products are used to measure oxide, STI, and metal CMP processes.
Filmetrics stocks instruments that measure the thousands of dielectric films used throughout industry.
CVD, dielectrics, barrier, PECVD, passivation, insulator, protection, Al2O3, CoO, ZnO, MoO, TiO2, Cr2O3, Nb2O5
Glass & Plastic Thickness
Measure thickness of glass and plastic materials up to 13mm thick.
Glass, Borosilicate glass, BSG, pyrex, BK7, Float glass, Crown glass, Soda-lime glass, SLG, Tube, tubing, Polyvinyl chloride, PVC, Plastic, Plastic film, Polymers, Tygon, Air gap, Lens, Acrylic, PMMA, acrylate, Lucite, Plexiglass, Perspex, Quartz, Fused Silica, Schott, Ohara, Pilkington, Polycarbonate, PC, Lexan, Makrolon, Polyethylene naphthalate, PEN, PET, Mylar, Melinex, Estar, PETE, Polyethylene, PE, LDPE, HDPE, Polypropylene, PP, Polystyrene, PS, Polylactic acid, PLA, Silicone, Optics, Ophthalmic, Vials
Filmetrics systems are used widely in the automotive industry to verify hardcoat and primer thickness.
Acrylic, Automotive industry, Chemical resistance, Clear coating, Decorative coating, Hardcoat, Eyewear, Face shield, Hardcoat, Hardness, Interpenetration Layer, Marring, Ophthalmic lens, Optical quality, Plastic lens, Polycarbonate, Polyester, Siloxane, Primer, Protective film, Scratch resistant, Screen protection, Surface finish, Surface protection, Thermal cure, Top coating, Touch screen, UV coating, UV cure
IC Failure Analysis
The F3-sX is used throughout the chip making industry to measure backside thinning of silicon.
Failure Analysis, FA, Silicon, Si, Integrated circuit, IC, Polishing, Backside failure analysis, Silicon thinning
ITO & Other TCOs
Proprietary analysis algorithms allow one-click measurement of TCO thickness, index, and k.
Indium tin oxide, ITO, tin-doped indium oxide, Transparent conductive oxide, TCO, Display, Front contact, Transparent Electrode, LED, LCD, Solar, Fluorine-doped tin oxide, FTO, TEC, TEC glass, Aluminum zinc oxide, AZO, Aluminum-doped zinc oxide, Zinc oxide, iZO, Indium zinc oxide, IZO, zinc-doped indium oxide
Measure thickness of angioplasty balloons, stent and implant coatings, and many others.
Stents, drug-coated stents, Drug-coating, Balloons, Angioplasty, Parylene, Microfluidic device, Air gap, Catheter, Membranes
Measure thickness, index, and k of metal films up to 50nm thick.
Metallized, Metallization, Foils, Stents, Mirrors, Steel, Stainless Steel, Gold, Nickel, Aluminium, Silver, Cobalt, Zinc, Molybdenum, Titanium, Chrome, Chromium, Niobium, Tungsten, Gallium, Germanium
Measure thickness and index of NPB, AlQ3, PEDOT, P3HT, soluble Teflons, etc…
PLED, AMOLED, Hole Transport (HT), Hole Injection Layer (HIL), Host Materials, anode, cathode, Alq3, NPB, phenylene vinylene, carbazole, thiophene, aniline, styrenesulfonate, phthalocyanine, naphthalene, fluorene, lithium, silver, ITO, calcium
Use the F10-AR to measure reflectance and color, as well as AR and hardcoat layer thicknesses.
eyeglasses, HC, hardcoat, scratch resistant, AR, anti-reflection, reflectance, UV curable, hydrophillic, polycarbonate, high index, CR39, MR-6, MR-7, Trivex
Simply set your parylene-coated sample on the stage of the F3-CS to measure its thickness!
We’ve measured dozens of different resists, and can generate index files for any resist you use.
SU-8, resist, Photoresist, PR, AZ, AZP, ZEP, positive, negative, g-line, i-line, KrF, PMMA, FEP, GRX, KMPR
Measure thickness, porosity, refractive index, and k of your porous silicon films.
Filmetrics offers a full range of products for measuring semiconductor process films.
Refractive Index & k
Measure refractive index and extinction coefficient over wavelengths as wide as 190-1700nm.
n & k, complex, real , imaginary, refractive index, absorption, extinction coefficient, indices, Kramers-Kronig, optical dispersion, dielectric, Lorentz, Cauchy, photoresist, anomalous dispersion, path length
Silicon Wafers & Membranes
We offer tabletop, mapping, and production systems for measuring silicon up to 2mm thick.
Measure CdTe, CdS, CIGS, amorphous-Si, TCOs, anti-reflection (AR) layers, and more...
Copper indium gallium diselenide, CIGS, Cadmium telluride, CdTe, Cad tel,, Amorphous silicon, Amorphous Si, a-Si, Cadmium sulfide, CdS, window layer, buffer layer, Thin-film photovoltaic, Thin-film PV, TFPV, photovoltaics, Solar, Solar cells, Inline, In-situ, Roll-to-roll, R2R, Evaporation, Sputtering, CVD, MOCVD, PECVD, Transparent conductive oxide, TCO, Indium tin oxide, ITO, tin-doped indium oxide
Semiconductor Teaching Labs
More than fifty Filmetrics F20s have been delivered for use in university teaching labs.
Surface Roughness & Finish
3-dimensional surface profile measurements to characterize surface roughness.
Filmetrics systems are widely used in the polymer-films community to measure thickness in-line.
Roll to roll, Roll measurements, Roll systems, Rolling substrate, Roll fed, Roll web, Reel to reel , R2R, Web coater, Autoweb, In-line, In-line monitor, Online thickness, Line monitoring system, Precision measuring tools, Automatic, Feeding, Production, Multipoint, High speed